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Electrical performance comparison of embedded Si1-xGex source/drain junctions processed in 200 mm and 300 mmEpi-reactors

Date

2008
Proceedings Paper
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dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorMachkaoutsan, Vladimir
dc.contributor.authorTomasini, P.
dc.contributor.authorThomas, S.G.
dc.contributor.authorWise, R.
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorMachkaoutsan, Vladimir
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-17T06:15:12Z
dc.date.available2021-10-17T06:15:12Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13341
dc.source.beginpage539
dc.source.conferenceSemiconductor Advances for Future Electronics Workshop - SAFE
dc.source.conferencedate27/11/2008
dc.source.conferencelocationVeldhoven The Netherlands
dc.source.endpage543
dc.title

Electrical performance comparison of embedded Si1-xGex source/drain junctions processed in 200 mm and 300 mmEpi-reactors

dc.typeProceedings paper
dspace.entity.typePublication
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