Publication:

To bake or not to bake... : the role of prebake in the EUV resist process

Date

2022-05-25
Proceedings Paper
https://doi.org/10.1117/12.2616094
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dc.contributor.authorPollentier, Ivan
dc.contributor.authorRathore, Ashish
dc.contributor.authorGupta, Mihir
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorSuh, Hyo Seon
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorRathore, Ashish
dc.contributor.imecauthorGupta, Mihir
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecGupta, Mihir::0000-0003-0286-7997
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2023-06-14T09:30:02Z
dc.date.available2022-09-08T02:38:38Z
dc.date.available2022-11-07T08:06:23Z
dc.date.available2022-11-25T09:21:47Z
dc.date.available2023-06-14T09:30:02Z
dc.date.embargo2022-05-31
dc.date.issued2022-05-25
dc.identifier.doi10.1117/12.2616094
dc.identifier.eisbn978-1-5106-4986-6
dc.identifier.isbn978-1-5106-4985-9
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40368
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1205507
dc.source.conferenceConference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateAPR 24-MAY 27, 2022
dc.source.conferencelocationSan Jose
dc.source.journalAdvances in Patterning Materials and Processes XXXIX
dc.source.numberofpages7
dc.source.volume12055
dc.subject.disciplineElectrical & electronic engineering
dc.title

To bake or not to bake... : the role of prebake in the EUV resist process

dc.typeProceedings paper
dspace.entity.typePublication
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