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Cryo-etching for integration in micro-electronic : Silicon deep etch for contact and low-k integration in Back end of line (BEOL)
Publication:
Cryo-etching for integration in micro-electronic : Silicon deep etch for contact and low-k integration in Back end of line (BEOL)
Date
2017
Meeting abstract
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36181.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Chanson, Romain
;
Lefaucheux, Philippe
;
Dussart, Remi
;
Shen, Peng
;
Urabe, Keiichiro
;
Dussarat, Christian
;
Maekawa, Kaoru
;
yatsuda, koichi
;
Tahara, Shigeru
;
de Marneffe, Jean-Francois
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2027
since deposited on 2021-10-24
Acq. date: 2025-10-23
Citations
Metrics
Views
2027
since deposited on 2021-10-24
Acq. date: 2025-10-23
Citations