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Sealing of porous low-k dielectrics: an ellipsometric porosimetry study of UV-O3 oxidized SiOxCy films
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Sealing of porous low-k dielectrics: an ellipsometric porosimetry study of UV-O3 oxidized SiOxCy films
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Date
2004
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Whelan, Caroline
;
Le, Quoc Toan
;
Cecchet, Francesca
;
Satta, Alessandra
;
Pireaux, Jean-Jacques
;
Rudolf, Petra
;
Maex, Karen
Journal
Electrochemical and Solid-State Letters
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1904
since deposited on 2021-10-15
Acq. date: 2025-12-10
Citations
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Views
1904
since deposited on 2021-10-15
Acq. date: 2025-12-10
Citations