Publication:
Highly doped low-temperature Si:P growth for source/drain formation in advanced Si nFETs
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1976 since deposited on 2021-10-24
4last month
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Acq. date: 2026-08-06
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Statistics
Views
1976 since deposited on 2021-10-24
4last month
1last week
Acq. date: 2026-08-06
Citations