Publication:

Highly doped low-temperature Si:P growth for source/drain formation in advanced Si nFETs

Date

2017

Meeting abstract

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Author(s)

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Hikavyy, Andriy

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Porret, Clément

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Vandooren, Anne

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Veloso, Anabela

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Collaert, Nadine

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Statistics

1968 since deposited on 2021-10-24

Acq. date: 2026-03-17