Publication:
Highly doped low-temperature Si:P growth for source/drain formation in advanced Si nFETs
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1964 since deposited on 2021-10-24
6last month
1last week
Acq. date: 2025-12-11
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Views
1964 since deposited on 2021-10-24
6last month
1last week
Acq. date: 2025-12-11
Citations