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Growth inhibition of metal oxide ALD on advanced patterning film (APF) for tone reversal of HfO2 and TiO2 patterned structures

Date

2017
Proceedings Paper
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dc.contributor.authorStevens, Eric
dc.contributor.authorTomczak, Yoann
dc.contributor.authorChan, BT
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDelabie, Annelies
dc.contributor.authorParsons, Gregory
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.accessioned2021-10-24T14:16:11Z
dc.date.available2021-10-24T14:16:11Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29506
dc.identifier.urlhttps://www.researchgate.net/publication/318561942_Growth_Inhibition_of_Metal_Oxide_ALD_on_Advanced_Patterning_Film_APF_for_Tone
dc.source.conference17th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate15/07/2017
dc.source.conferencelocationDenver, CO USA
dc.title

Growth inhibition of metal oxide ALD on advanced patterning film (APF) for tone reversal of HfO2 and TiO2 patterned structures

dc.typeProceedings paper
dspace.entity.typePublication
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