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Study of copper drift during TDDB of intermetal dielectrics by using fully passivated MOS capacitors as test vehicle
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Acq. date: 2026-08-14
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Acq. date: 2026-08-14
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1 since deposited on 2021-10-17
Acq. date: 2026-08-14
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1833 since deposited on 2021-10-17
1last month
Acq. date: 2026-08-14
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