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Study of copper drift during TDDB of intermetal dielectrics by using fully passivated MOS capacitors as test vehicle
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Study of copper drift during TDDB of intermetal dielectrics by using fully passivated MOS capacitors as test vehicle
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Croes, Kristof
;
Cannata, Gianluca
;
Zhao, Larry
;
Tokei, Zsolt
Journal
Microelectronics Reliability
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Downloads
1
since deposited on 2021-10-17
Acq. date: 2025-12-17
Views
1828
since deposited on 2021-10-17
1
last month
1
last week
Acq. date: 2025-12-17
Citations