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Conference contributions
A novel integration scheme for wafer singulation and selective processing using temporary dry film resist
Publication:
A novel integration scheme for wafer singulation and selective processing using temporary dry film resist
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Date
2021
Proceedings Paper
https://doi.org/10.1109/ECTC32696.2021.00136
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
La Grappe, Alexandre
;
Visker, Evert
;
Redolfi, Augusto
;
Peng, Lan
;
Muga, Karthik
;
Huls, David
;
Vanhaelemeersch, Serge
;
Lauwers, Anne
;
Ackaert, Jan
Journal
na
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1897
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Acq. date: 2025-12-16
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Metrics
Views
1897
since deposited on 2022-03-16
4
last month
2
last week
Acq. date: 2025-12-16
Citations