Publication:

Nucleation and growth of TiN films deposited by atomic layer deposition

Date

2002
Proceedings Paper
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dc.contributor.authorSatta, Alessandra
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorSchuhmacher, Jörg
dc.contributor.authorConard, Thierry
dc.contributor.authorBeyer, Gerald
dc.contributor.authorMaex, Karen
dc.contributor.authorViitanen, M.M.
dc.contributor.authorBrongersma, H.H.
dc.contributor.authorBesling, W.
dc.contributor.authorKilpela, Olli
dc.contributor.authorSprey, Hessel
dc.contributor.authorVantomme, Andre
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorSprey, Hessel
dc.contributor.imecauthorVantomme, Andre
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-14T23:02:21Z
dc.date.available2021-10-14T23:02:21Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6790
dc.source.beginpage52
dc.source.conferenceProceedings of the 3rd AVS International Conference on Microelectronics and Interfaces
dc.source.conferencedate11/02/2002
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage54
dc.title

Nucleation and growth of TiN films deposited by atomic layer deposition

dc.typeProceedings paper
dspace.entity.typePublication
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