Characterization of highly doped Si:P, Si:As and Si:P:As Epi layers for source/drain epitaxy

Rosseel, Erik; Tirrito, Matteo; Porret, Clément; Douhard, Bastien; Meersschaut, Johan; Hikavyy, Andriy; Loo, Roger; Horiguchi, Naoto; Pourtois, Geoffrey; Nakazaki, Nobuya; Tolle, John

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Characterization of highly doped Si:P, Si:As and Si:P:As Epi layers for source/drain epitaxy

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2019

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Characterization of highly doped Si:P, Si:As and Si:P:As Epi layers for source/drain epitaxy

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