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Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning
Publication:
Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning
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Date
1999
Proceedings Paper
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3522.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kim, Young-Chang
;
Beckx, Stephan
;
Vanhaelemeersch, Serge
;
Vandervorst, Wilfried
Journal
Abstract
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1921
since deposited on 2021-10-06
Acq. date: 2025-12-09
Citations
Metrics
Views
1921
since deposited on 2021-10-06
Acq. date: 2025-12-09
Citations