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Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning

Date

1999
Proceedings Paper
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dc.contributor.authorKim, Young-Chang
dc.contributor.authorBeckx, Stephan
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-06T11:30:28Z
dc.date.available2021-10-06T11:30:28Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3557
dc.source.beginpage153
dc.source.conferenceUltra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
dc.source.endpage156
dc.title

Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning

dc.typeProceedings paper
dspace.entity.typePublication
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