Publication:

Status and critical challenges for 157nm lithography

Date

2004
Journal article
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Author(s)

Ronse, Kurt  
;
De Bisschop, Peter  
;
Goethals, Mieke
;
Hermans, Jan  
;
Jonckheere, Rik  
;
Light, Scott
;
Okoroanyanwu, Uzo
;
Watso, Robert
;
McAfferty, D.
;
Ivaldi, J.
;
Oneil, T.
;
Sewell, H.

Journal

Microelectronic Engineering

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