Publication:
Status and critical challenges for 157nm lithography
Date
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Hermans, Jan | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Light, Scott | |
| dc.contributor.author | Okoroanyanwu, Uzo | |
| dc.contributor.author | Watso, Robert | |
| dc.contributor.author | McAfferty, D. | |
| dc.contributor.author | Ivaldi, J. | |
| dc.contributor.author | Oneil, T. | |
| dc.contributor.author | Sewell, H. | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.contributor.imecauthor | Hermans, Jan | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.date.accessioned | 2021-10-15T15:54:13Z | |
| dc.date.available | 2021-10-15T15:54:13Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9526 | |
| dc.source.beginpage | 5 | |
| dc.source.endpage | 10 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 73-74 | |
| dc.title | Status and critical challenges for 157nm lithography | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |