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High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification
Publication:
High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification
Date
2020
Proceedings Paper
https://doi.org/10.1117/12.2572912
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Cross, Andrew
;
Sah, Kaushik
;
Anantha, Vidyasagar
;
Gupta, Balarka
;
Ynzunza, Ramon
;
Troy, Neil
;
Wu, Kenong
;
Babulnath, Raghav
;
Rajendran, Meghna
;
Van den Heuvel, Dieter
;
Leray, Philippe
Journal
Proceedings of SPIE
Abstract
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1758
since deposited on 2021-11-02
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Acq. date: 2025-10-25
Citations
Metrics
Views
1758
since deposited on 2021-11-02
423
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations