Publication:

High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification

Date

2020
Proceedings Paper
https://doi.org/10.1117/12.2572912
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dc.contributor.authorCross, Andrew
dc.contributor.authorSah, Kaushik
dc.contributor.authorAnantha, Vidyasagar
dc.contributor.authorGupta, Balarka
dc.contributor.authorYnzunza, Ramon
dc.contributor.authorTroy, Neil
dc.contributor.authorWu, Kenong
dc.contributor.authorBabulnath, Raghav
dc.contributor.authorRajendran, Meghna
dc.contributor.authorVan den Heuvel, Dieter
dc.contributor.authorLeray, Philippe
dc.contributor.imecauthorVan den Heuvel, Dieter
dc.contributor.imecauthorLeray, Philippe
dc.date.accessioned2022-01-27T16:58:44Z
dc.date.available2021-11-02T16:03:40Z
dc.date.available2022-01-27T16:58:44Z
dc.date.issued2020
dc.identifier.doi10.1117/12.2572912
dc.identifier.eisbn978-1-5106-3843-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38080
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage11517OU
dc.source.conferenceConference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 21-25, 2020
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.source.volume11517
dc.title

High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification

dc.typeProceedings paper
dspace.entity.typePublication
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