Publication:

Review of silicon nanowire oxidation

Date

2011
Proceedings Paper
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dc.contributor.authorShi, Xiaoping
dc.contributor.authorKurstjens, Rufi
dc.contributor.authorVos, Ingrid
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorSchaekers, Marc
dc.contributor.imecauthorKurstjens, Rufi
dc.contributor.imecauthorVos, Ingrid
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.accessioned2021-10-19T18:43:46Z
dc.date.available2021-10-19T18:43:46Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19769
dc.identifier.urlhttp://www.ecsdl.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=ECSTF8000034000001000535000001&idtype=cvips&prog=normal
dc.source.beginpage535
dc.source.conferenceChina Semiconductor Technology International Conference - CSTIC
dc.source.conferencedate13/03/2011
dc.source.conferencelocationShanghai China
dc.source.endpage540
dc.title

Review of silicon nanowire oxidation

dc.typeProceedings paper
dspace.entity.typePublication
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