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Electrical and mechanical characterization of chemical vapor deposition of tungsten on sputter-deposited TiN layers
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Electrical and mechanical characterization of chemical vapor deposition of tungsten on sputter-deposited TiN layers
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Date
1995
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhang, S. L.
;
Palmans, Roger
;
Petersson, C. S.
;
Maex, Karen
Journal
J. Appl. Phys.
Abstract
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1956
since deposited on 2021-09-29
2
last month
Acq. date: 2025-12-09
Citations
Metrics
Views
1956
since deposited on 2021-09-29
2
last month
Acq. date: 2025-12-09
Citations