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Challenges on surface conditioning in 3D device architectures: triple-gate finFETs, gate-all-around lateral and vertical nanowireFETs

Date

2017
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dc.contributor.authorVeloso, Anabela
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorVecchio, Emma
dc.contributor.authorDevriendt, Katia
dc.contributor.authorLi, Waikin
dc.contributor.authorSimoen, Eddy
dc.contributor.authorChan, BT
dc.contributor.authorTao, Zheng
dc.contributor.authorRosseel, Erik
dc.contributor.authorLoo, Roger
dc.contributor.authorMilenin, Alexey
dc.contributor.authorKunert, Bernardette
dc.contributor.authorTeugels, Lieve
dc.contributor.authorSebaai, Farid
dc.contributor.authorLorant, Christophe
dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorBrus, Stephan
dc.contributor.authorMarien, Philippe
dc.contributor.authorSibaja-Hernandez, Arturo
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorLi, Waikin
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorKunert, Bernardette
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorLorant, Christophe
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorMarien, Philippe
dc.contributor.imecauthorSibaja-Hernandez, Arturo
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecKunert, Bernardette::0000-0002-8986-4109
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.contributor.orcidimecLorant, Christophe::0000-0001-7363-9348
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-24T17:30:33Z
dc.date.available2021-10-24T17:30:33Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29810
dc.identifier.urlhttps://ecs.confex.com/ecs/232/webprogram/Paper101970.html
dc.source.beginpage1055
dc.source.conference15th International Symposium on Semiconductor Cleaning Science and Technology at the 232nd ECS Fall Meeting
dc.source.conferencedate1/10/2017
dc.source.conferencelocationNational Harbor, MD USA
dc.title

Challenges on surface conditioning in 3D device architectures: triple-gate finFETs, gate-all-around lateral and vertical nanowireFETs

dc.typeMeeting abstract
dspace.entity.typePublication
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