Publication:

Analysis of advanced technology nodes and h-NA EUV introduction: a cost perspective

Date

2021
Proceedings Paper
https://doi.org/10.1117/12.2600804
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dc.contributor.authorMirabelli, Gioele
dc.contributor.authorWang, Jane
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorWeckx, Pieter
dc.contributor.authorSpessot, Alessio
dc.contributor.authorRonse, Kurt
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorHellings, Geert
dc.contributor.authorRyckaert, Julien
dc.contributor.imecauthorMirabelli, Gioele
dc.contributor.imecauthorWang, Jane
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorWeckx, Pieter
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.orcidimecMirabelli, Gioele::0000-0001-7060-4836
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.date.accessioned2022-07-01T08:24:21Z
dc.date.available2022-05-22T02:19:05Z
dc.date.available2022-05-30T13:16:05Z
dc.date.available2022-06-21T06:52:25Z
dc.date.available2022-06-23T06:51:26Z
dc.date.available2022-07-01T08:24:21Z
dc.date.issued2021
dc.identifier.doi10.1117/12.2600804
dc.identifier.eisbn978-1-5106-4553-0
dc.identifier.isbn978-1-5106-4552-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39864
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage11854OD
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 27-OCT 01, 2021
dc.source.conferencelocationOnline
dc.source.journalSPIE Proceedings; Volume 11854,
dc.source.numberofpages10
dc.source.volume11854
dc.title

Analysis of advanced technology nodes and h-NA EUV introduction: a cost perspective

dc.typeProceedings paper
dspace.entity.typePublication
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