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Advanced carrier depth profiling on Si and Ge with micro four-point probe

Date

2008
Journal article
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dc.contributor.authorClarysse, Trudo
dc.contributor.authorEyben, Pierre
dc.contributor.authorParmentier, Brigitte
dc.contributor.authorVan Daele, Benny
dc.contributor.authorSatta, Alessandra
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorLin, Rong
dc.contributor.authorPetersen, Dirch H.
dc.contributor.authorFolmer Nielsen, Peter
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorParmentier, Brigitte
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-17T06:34:55Z
dc.date.available2021-10-17T06:34:55Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13541
dc.source.beginpage317
dc.source.endpage321
dc.source.issue1
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.volume26
dc.title

Advanced carrier depth profiling on Si and Ge with micro four-point probe

dc.typeJournal article
dspace.entity.typePublication
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