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Post-etch sidewall residues in metal hard mask/porous low-k single damascene structures: Characterization and wet removal
Publication:
Post-etch sidewall residues in metal hard mask/porous low-k single damascene structures: Characterization and wet removal
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Date
2010
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Le, Quoc Toan
;
de Marneffe, Jean-Francois
;
Conard, Thierry
;
Lux, Marcel
;
Vereecke, Guy
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1788
since deposited on 2021-10-18
Acq. date: 2026-01-06
Citations
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Views
1788
since deposited on 2021-10-18
Acq. date: 2026-01-06
Citations