Publication:
Post-etch sidewall residues in metal hard mask/porous low-k single damascene structures: Characterization and wet removal
Date
| dc.contributor.author | Le, Quoc Toan | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Conard, Thierry | |
| dc.contributor.author | Lux, Marcel | |
| dc.contributor.author | Vereecke, Guy | |
| dc.contributor.imecauthor | Le, Quoc Toan | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.contributor.imecauthor | Conard, Thierry | |
| dc.contributor.imecauthor | Lux, Marcel | |
| dc.contributor.imecauthor | Vereecke, Guy | |
| dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
| dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
| dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
| dc.date.accessioned | 2021-10-18T18:06:51Z | |
| dc.date.available | 2021-10-18T18:06:51Z | |
| dc.date.issued | 2010 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17460 | |
| dc.source.conference | SEMATECH Surface Preparation and Cleaning Conference | |
| dc.source.conferencedate | 22/03/2010 | |
| dc.source.conferencelocation | Austin, TX USA | |
| dc.title | Post-etch sidewall residues in metal hard mask/porous low-k single damascene structures: Characterization and wet removal | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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