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Alternative double patterning processes: ready for (sub) 32nm hp
Publication:
Alternative double patterning processes: ready for (sub) 32nm hp
Date
2009
Proceedings Paper
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20017.pdf
1.19 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wong, Patrick
;
Maenhoudt, Mireille
;
Vangoidsenhoven, Diziana
;
Wiaux, Vincent
Journal
Abstract
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1896
since deposited on 2021-10-18
Acq. date: 2025-10-22
Citations
Metrics
Views
1896
since deposited on 2021-10-18
Acq. date: 2025-10-22
Citations