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Tantalum-based gate electrode metals for advanced CMOS devices
Publication:
Tantalum-based gate electrode metals for advanced CMOS devices
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hooker, Jacob
;
Lander, Rob
;
Cubaynes, Florence
;
Schram, Tom
;
Roozeboom, F.
;
van Zijl, J.
;
Maas, M.
;
van den Heuvel, F.C.
;
Naburgh, E.
;
van Berkum, J.G.M.
;
Tamminga, Y.
;
Dao, T.
;
Henson, Kirklen
;
Schaekers, Marc
;
Van Ammel, Annemie
;
Tokei, Zsolt
;
Demand, Marc
;
Dachs, C.
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1969
since deposited on 2021-10-16
Acq. date: 2025-12-09
Citations
Metrics
Views
1969
since deposited on 2021-10-16
Acq. date: 2025-12-09
Citations