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Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node
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2004 since deposited on 2021-10-22
1last month
Acq. date: 2026-01-25
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Statistics
Views
2004 since deposited on 2021-10-22
1last month
Acq. date: 2026-01-25
Citations