Publication:
Characterization of thermal and electrical stability of MOCVD HfO2-HfSiO4 dielectric layers with polysilicon electrodes for advanced CMOS technologies
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1878 since deposited on 2021-10-15
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Acq. date: 2026-02-27
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Statistics
Views
1878 since deposited on 2021-10-15
1last month
1last week
Acq. date: 2026-02-27
Citations