Publication:
Characterization of thermal and electrical stability of MOCVD HfO2-HfSiO4 dielectric layers with polysilicon electrodes for advanced CMOS technologies
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1882 since deposited on 2021-10-15
2last month
Acq. date: 2026-05-18
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Statistics
Views
1882 since deposited on 2021-10-15
2last month
Acq. date: 2026-05-18
Citations