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Characterization of thermal and electrical stability of MOCVD HfO2-HfSiO4 dielectric layers with polysilicon electrodes for advanced CMOS technologies
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1875 since deposited on 2021-10-15
Acq. date: 2025-10-23
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Views
1875 since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations