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Plasma hydrogenation of strain-relaxed SiGe/Si heterostructure for layer transfer

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dc.contributor.authorChen, Peng
dc.contributor.authorChu, Paul K.
dc.contributor.authorHöchbauer, T.
dc.contributor.authorNastasi, M.
dc.contributor.authorBuca, D.
dc.contributor.authorMantl, S.
dc.contributor.authorTheodore, N. David
dc.contributor.authorAlford, T.L.
dc.contributor.authorMayer, J. W.
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorCai, M.
dc.contributor.authorLau, S.
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-15T12:51:12Z
dc.date.available2021-10-15T12:51:12Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8673
dc.source.beginpage4944
dc.source.endpage4946
dc.source.issue21
dc.source.journalApplied Physics Letters
dc.source.volume85
dc.title

Plasma hydrogenation of strain-relaxed SiGe/Si heterostructure for layer transfer

dc.typeJournal article
dspace.entity.typePublication
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