Publication:

Evaluation of the accuracy and precision of STEM and EDS metrology on horizontal GAA nanowire devices

Date

2019
Proceedings Paper
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dc.contributor.authorJohanesen, Hayley
dc.contributor.authorStrauss, Michael
dc.contributor.authorKenslea, Anne
dc.contributor.authorHakala, Chris
dc.contributor.authorKwakman, Laurens
dc.contributor.authorBoullart, Werner
dc.contributor.authorMertens, Hans
dc.contributor.authorSiew, Yong Kong
dc.contributor.authorBarla, Kathy
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorSiew, Yong Kong
dc.contributor.imecauthorBarla, Kathy
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-27T10:59:05Z
dc.date.available2021-10-27T10:59:05Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33229
dc.identifier.urlhttps://doi.org/10.1117/12.2514995
dc.source.beginpage109591C
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIII
dc.source.conferencedate24/12/2019
dc.source.conferencelocationSan Jose USA
dc.title

Evaluation of the accuracy and precision of STEM and EDS metrology on horizontal GAA nanowire devices

dc.typeProceedings paper
dspace.entity.typePublication
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