Tall triple-gate device with TiN/HfO2 gate stack

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Author(s)

Collaert, Nadine

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Ferain, Isabelle

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Singanamalla, Raghunath

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Zimmerman, Paul

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Mannaert, Geert

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Goodwin, Michael

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Neuilly, Francois

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Kim, Myeong-Cheol

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De Meyer, Kristin

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De Gendt, Stefan

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Boullart, Werner

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Biesemans, Serge

Metrics

1978 since deposited on 2021-10-16

Acq. date: 2025-10-23