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Raising oxide: nitride selectivity to aid in the CMP of shallow trench isolation type applications
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Raising oxide: nitride selectivity to aid in the CMP of shallow trench isolation type applications
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Date
1997
Proceedings Paper
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1999.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mills, C. R.
;
Grover, G. S.
;
Mueller, B. L.
;
Steckenrider, J. S.
;
Ganeshkumar, S.
;
Leach, G. W.
;
Huang, C. K.
;
Grillaert, Joost
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1913
since deposited on 2021-09-30
Acq. date: 2025-12-15
Citations
Metrics
Views
1913
since deposited on 2021-09-30
Acq. date: 2025-12-15
Citations