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Raising oxide: nitride selectivity to aid in the CMP of shallow trench isolation type applications

Date

1997
Proceedings Paper
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dc.contributor.authorMills, C. R.
dc.contributor.authorGrover, G. S.
dc.contributor.authorMueller, B. L.
dc.contributor.authorSteckenrider, J. S.
dc.contributor.authorGaneshkumar, S.
dc.contributor.authorLeach, G. W.
dc.contributor.authorHuang, C. K.
dc.contributor.authorGrillaert, Joost
dc.date.accessioned2021-09-30T09:18:26Z
dc.date.available2021-09-30T09:18:26Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2025
dc.source.beginpage179
dc.source.conferenceProceedings 2nd International Chemical-Mechanical Polish (C.M.P.) for ULSI Multilevel Interconnection Conference - CMP-MIC
dc.source.conferencedate13/02/1997
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage185
dc.title

Raising oxide: nitride selectivity to aid in the CMP of shallow trench isolation type applications

dc.typeProceedings paper
dspace.entity.typePublication
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