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Advanced solutions for copper and low k technology

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dc.contributor.authorBeyer, Gerald
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorDe Roest, David
dc.contributor.authorDonaton, R.
dc.contributor.authorGrillaert, Joost
dc.contributor.authorLanckmans, Filip
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorMaex, Karen
dc.contributor.authorRichard, Emmanuel
dc.contributor.authorStruyf, Herbert
dc.contributor.authorStucchi, Michele
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorVervoort, Iwan
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecStruyf, Herbert::0000-0002-6782-5424
dc.date.accessioned2021-10-14T12:40:54Z
dc.date.available2021-10-14T12:40:54Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4117
dc.source.conferenceSemicon Europe; 2000; München, Germany.
dc.source.conferencelocation
dc.title

Advanced solutions for copper and low k technology

dc.typeOral presentation
dspace.entity.typePublication
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