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Performance and manufacturability of the Co/Ti (cap) silicidation process for 0.25μm MOS technologies

Date

1998
Proceedings Paper
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dc.contributor.authorLauwers, Anne
dc.contributor.authorBesser, Paul
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorKondoh, Eiichi
dc.contributor.authorRoelandts, Nico
dc.contributor.authorSteegen, An
dc.contributor.authorStucchi, Michele
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorBesser, Paul
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-09-30T12:31:41Z
dc.date.available2021-09-30T12:31:41Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2710
dc.source.beginpage99
dc.source.conferenceProceedings of the IEEE 1998 International Interconnect Technology Conference - IITC
dc.source.conferencedate1/06/1998
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage101
dc.title

Performance and manufacturability of the Co/Ti (cap) silicidation process for 0.25μm MOS technologies

dc.typeProceedings paper
dspace.entity.typePublication
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