Publication:

LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3034695
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dc.contributor.authorGustas, Dominykas
dc.contributor.authorBorman, Sam
dc.contributor.authorOorschot, Dorothe
dc.contributor.authorBekaert, Joost
dc.contributor.authorVan Loo, Hilbert
dc.contributor.authorHorsten, Frank
dc.contributor.authorVaenkatesan, Vidya
dc.contributor.authorColina, Alberto
dc.contributor.authorvan Rhee, Tasja
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2025-07-01T10:22:51Z
dc.date.available2025-05-11T05:43:40Z
dc.date.available2025-07-01T10:22:51Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3034695
dc.identifier.eisbn978-1-5106-8156-9
dc.identifier.isbn978-1-5106-8155-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45647
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 132150Q
dc.source.conference2024 International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 30-OCT 03, 2024
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages16
dc.source.volume13215
dc.title

LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics

dc.typeProceedings paper
dspace.entity.typePublication
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