Publication:

Improving polymethacrylate EUV resists with TiO2 area-selective deposition

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2613815
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dc.contributor.authorNye, Rachel
dc.contributor.authorVan Dongen, Kaat
dc.contributor.authorOka, Hironori
dc.contributor.authorFurutani, Hajime
dc.contributor.authorParsons, Gregory
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorNye, Rachel
dc.contributor.imecauthorVan Dongen, Kaat
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.date.accessioned2023-06-05T14:43:34Z
dc.date.available2022-09-08T02:38:57Z
dc.date.available2023-06-05T14:43:34Z
dc.date.issued2022
dc.identifier.doi10.1117/12.2613815
dc.identifier.eisbn978-1-5106-4986-6
dc.identifier.isbn978-1-5106-4985-9
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40377
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage120550C
dc.source.conferenceConference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateAPR 24-MAY 27, 2022
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages9
dc.source.volume12055
dc.subject.keywordsATOMIC LAYER DEPOSITION
dc.title

Improving polymethacrylate EUV resists with TiO2 area-selective deposition

dc.typeProceedings paper
dspace.entity.typePublication
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