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Development of a contact edge roughness measurement methodology and its sources in 193nm patterning
Publication:
Development of a contact edge roughness measurement methodology and its sources in 193nm patterning
Date
2003
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vandeweyer, Tom
;
Maerhoudt,
;
de Marneffe, Jean-Francois
;
Dirksen, Peter
Journal
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1849
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Acq. date: 2025-10-24
Citations
Metrics
Views
1849
since deposited on 2021-10-15
432
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations