Publication:
Development of a contact edge roughness measurement methodology and its sources in 193nm patterning
Date
| dc.contributor.author | Vandeweyer, Tom | |
| dc.contributor.author | Maerhoudt, | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Dirksen, Peter | |
| dc.contributor.imecauthor | Vandeweyer, Tom | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.date.accessioned | 2021-10-15T07:30:44Z | |
| dc.date.available | 2021-10-15T07:30:44Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8336 | |
| dc.source.conference | Interface '03 | |
| dc.source.conferencedate | 22/09/2003 | |
| dc.source.conferencelocation | San Diego, Ca USA | |
| dc.title | Development of a contact edge roughness measurement methodology and its sources in 193nm patterning | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |