Ion-implantation-based low-cost Hk/MG process for CMOS low-power application

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Author(s)

Ortolland, Claude

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Srividya, Vidya

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Degraeve, Robin

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Gilbert, Matthieu

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Kauerauf, Thomas

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Togo, Mitsuhiro

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Horiguchi, Naoto

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Groeseneken, Guido

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Biesemans, Serge

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Absil, Philippe

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Vandervorst, Wilfried

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Hoffmann, Thomas Y.

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1990 since deposited on 2021-10-18

Acq. date: 2025-10-23