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Ion-implantation-based low-cost Hk/MG process for CMOS low-power application
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Ion-implantation-based low-cost Hk/MG process for CMOS low-power application
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Date
2010
Proceedings Paper
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20251.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ortolland, Claude
;
Sahhaf, Sahar
;
Srividya, Vidya
;
Degraeve, Robin
;
Saino, Kanta
;
Kim, Chul-Sung
;
Gilbert, Matthieu
;
Kauerauf, Thomas
;
Cho, Moon Ju
;
Dehan, Morin
;
Schram, Tom
;
Togo, Mitsuhiro
;
Horiguchi, Naoto
;
Groeseneken, Guido
;
Biesemans, Serge
;
Absil, Philippe
;
Vandervorst, Wilfried
;
Gealy, Dan
;
Hoffmann, Thomas Y.
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1992
since deposited on 2021-10-18
Acq. date: 2025-12-11
Citations
Metrics
Views
1992
since deposited on 2021-10-18
Acq. date: 2025-12-11
Citations