Publication:

Ion-implantation-based low-cost Hk/MG process for CMOS low-power application

Date

2010
Proceedings Paper
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dc.contributor.authorOrtolland, Claude
dc.contributor.authorSahhaf, Sahar
dc.contributor.authorSrividya, Vidya
dc.contributor.authorDegraeve, Robin
dc.contributor.authorSaino, Kanta
dc.contributor.authorKim, Chul-Sung
dc.contributor.authorGilbert, Matthieu
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorCho, Moon Ju
dc.contributor.authorDehan, Morin
dc.contributor.authorSchram, Tom
dc.contributor.authorTogo, Mitsuhiro
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorBiesemans, Serge
dc.contributor.authorAbsil, Philippe
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorGealy, Dan
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.imecauthorSahhaf, Sahar
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-18T19:55:29Z
dc.date.available2021-10-18T19:55:29Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17747
dc.source.beginpage185
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate15/06/2010
dc.source.conferencelocationHonolulu, HI US
dc.source.endpage186
dc.title

Ion-implantation-based low-cost Hk/MG process for CMOS low-power application

dc.typeProceedings paper
dspace.entity.typePublication
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