Publication:

Resist line edge roughness mitigation for high-NA EUVL

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2605822
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dc.contributor.authorOhtomi, Eisuke
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorSeveri, Joren
dc.contributor.authorWelling, Ulrich
dc.contributor.authorTanaka, Yusuke
dc.contributor.authorDe Simone, Danilo
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2022-12-09T10:57:29Z
dc.date.available2022-09-08T02:39:17Z
dc.date.available2022-12-09T10:57:29Z
dc.date.issued2022
dc.identifier.doi10.1117/12.2605822
dc.identifier.eisbn978-1-5106-4986-6
dc.identifier.isbn978-1-5106-4985-9
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40386
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage120550K
dc.source.conferenceConference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateAPR 24-MAY 27, 2022
dc.source.conferencelocationSan Jose, CA, USA
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.source.volume12055
dc.title

Resist line edge roughness mitigation for high-NA EUVL

dc.typeProceedings paper
dspace.entity.typePublication
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