Publication:
Silicon-germanium (SiGe) technology for MEMS and NEMS fabrication
Date
| dc.contributor.author | Rottenberg, Xavier | |
| dc.contributor.imecauthor | Rottenberg, Xavier | |
| dc.date.accessioned | 2021-10-20T15:31:07Z | |
| dc.date.available | 2021-10-20T15:31:07Z | |
| dc.date.issued | 2012-03 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21429 | |
| dc.identifier.url | http://www.memsjournal.com/2012/03/silicon-germanium-sige-technolog-germanium-sige-technology-for-mems-and-nems-fabrication.html | |
| dc.source.journal | MEMS Investor Journal | |
| dc.title | Silicon-germanium (SiGe) technology for MEMS and NEMS fabrication | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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