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300mm wafer thinning and backside passivation compatibility with temporary wafer bonding for 3D stacked IC applications

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dc.contributor.authorJourdain, Anne
dc.contributor.authorBuisson, Thibault
dc.contributor.authorPhommahaxay, Alain
dc.contributor.authorPrivett, Marc
dc.contributor.authorWallace, Daniel
dc.contributor.authorSood, Sumant
dc.contributor.authorBisson, Peter
dc.contributor.authorBeyne, Eric
dc.contributor.authorTravaly, Youssef
dc.contributor.authorSwinnen, Bart
dc.contributor.imecauthorJourdain, Anne
dc.contributor.imecauthorPhommahaxay, Alain
dc.contributor.imecauthorBeyne, Eric
dc.contributor.imecauthorSwinnen, Bart
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.date.accessioned2021-10-18T17:25:05Z
dc.date.available2021-10-18T17:25:05Z
dc.date.issued2010-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17327
dc.source.conferenceIEEE International 3D System Integration Conference - 3DIC
dc.source.conferencedate16/11/2010
dc.source.conferencelocationMunich Germany
dc.title

300mm wafer thinning and backside passivation compatibility with temporary wafer bonding for 3D stacked IC applications

dc.typeMeeting abstract
dspace.entity.typePublication
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