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Conference contributions
Impact of advanced patterning options, 193nm and EUV, on local interconnect performance
Publication:
Impact of advanced patterning options, 193nm and EUV, on local interconnect performance
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Date
2012
Proceedings Paper
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24956.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Stucchi, Michele
;
Tokei, Zsolt
;
Demuynck, Steven
;
Siew, Yong Kong
Journal
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1826
since deposited on 2021-10-20
Acq. date: 2026-01-08
Citations
Metrics
Views
1826
since deposited on 2021-10-20
Acq. date: 2026-01-08
Citations