Back-channel-etch amorphous indium-gallium-zinc oxide thin-film transistors: The impact of source/drain metal etch and final passivation

Publication:

2014

Journal article

Author(s)

;

;

;

;

;

;

;

Japanese Journal of Applied Physics

1 since deposited on 2021-10-22

Acq. date: 2026-01-26

2053 since deposited on 2021-10-22

Acq. date: 2026-01-26