Publication:

Back-channel-etch amorphous indium-gallium-zinc oxide thin-film transistors: The impact of source/drain metal etch and final passivation

Date

2014
Journal article
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dc.contributor.authorNag, Manoj
dc.contributor.authorBhoolokam, Ajay
dc.contributor.authorSteudel, Soeren
dc.contributor.authorMyny, Kris
dc.contributor.authorMaas, Joris
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHeremans, Paul
dc.contributor.imecauthorNag, Manoj
dc.contributor.imecauthorMyny, Kris
dc.contributor.imecauthorMaas, Joris
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHeremans, Paul
dc.contributor.orcidimecMyny, Kris::0000-0002-5230-495X
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecHeremans, Paul::0000-0003-2151-1718
dc.contributor.orcidimecGroeseneken, Guido::0000-0003-3763-2098
dc.date.accessioned2021-10-22T04:07:11Z
dc.date.available2021-10-22T04:07:11Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24298
dc.source.beginpage111401
dc.source.issue11
dc.source.journalJapanese Journal of Applied Physics
dc.source.volume53
dc.title

Back-channel-etch amorphous indium-gallium-zinc oxide thin-film transistors: The impact of source/drain metal etch and final passivation

dc.typeJournal article
dspace.entity.typePublication
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