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Quantum transport study of transition-metal dichalcogenide top-contacted geometries investigating the impact of nonuniform doping, dielectric environment, and image-force barrier lowering

 
dc.contributor.authorBaikadi, Pranay
dc.contributor.authorVandenberghe, William
dc.contributor.authorReyntjens, Peter
dc.contributor.authorKim, Raseong
dc.contributor.authorvan de Put, Maarten
dc.contributor.imecauthorReyntjens, Peter
dc.date.accessioned2025-04-03T07:33:01Z
dc.date.available2025-01-11T17:18:35Z
dc.date.available2025-04-03T07:33:01Z
dc.date.issued2024
dc.description.wosFundingTextThis material is based upon work supported by Intel Corporation. We would like to express our special thanks to Dr. Ashish Verma Penumatcha from the Technology Research division at Intel Corporation for the many fruitful discussions during the course of this work. We acknowl-edge the Texas Advanced Computing Center (TACC, http:// www.tacc.utexas.edu/) at The University of Texas at Austin for providing the high-performance computing resources.
dc.identifier.doi10.1103/PhysRevApplied.22.064058
dc.identifier.issn2331-7019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45068
dc.publisherAMER PHYSICAL SOC
dc.source.beginpageArt. 064058
dc.source.endpageN/A
dc.source.issue6
dc.source.journalPHYSICAL REVIEW APPLIED
dc.source.numberofpages15
dc.source.volume22
dc.subject.keywordsMOS2 TRANSISTORS
dc.subject.keywordsPERFORMANCE
dc.subject.keywordsCHANNEL
dc.title

Quantum transport study of transition-metal dichalcogenide top-contacted geometries investigating the impact of nonuniform doping, dielectric environment, and image-force barrier lowering

dc.typeJournal article
dspace.entity.typePublication
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