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Printing the contact and metal layers for the 32 and 22 nm node: comparing positive and negative development process
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Printing the contact and metal layers for the 32 and 22 nm node: comparing positive and negative development process
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Date
2009
Proceedings Paper
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18883.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bekaert, Joost
;
Van Look, Lieve
;
Wiaux, Vincent
;
Truffert, Vincent
;
Maenhoudt, Mireille
;
Vandenberghe, Geert
;
Reybrouck, Mario
;
Tarutani, S.
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1912
since deposited on 2021-10-17
1
last month
Acq. date: 2025-12-13
Citations