Publication:

Printing the contact and metal layers for the 32 and 22 nm node: comparing positive and negative development process

Date

2009
Proceedings Paper
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dc.contributor.authorBekaert, Joost
dc.contributor.authorVan Look, Lieve
dc.contributor.authorWiaux, Vincent
dc.contributor.authorTruffert, Vincent
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorReybrouck, Mario
dc.contributor.authorTarutani, S.
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorReybrouck, Mario
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.date.accessioned2021-10-17T21:21:28Z
dc.date.available2021-10-17T21:21:28Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14967
dc.source.conference6th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
dc.title

Printing the contact and metal layers for the 32 and 22 nm node: comparing positive and negative development process

dc.typeProceedings paper
dspace.entity.typePublication
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