Publication:

Attenuated phase shift masks: an interview with Andreas Erdmann

Date

2022-12-28
Editorial Material
https://doi.org/10.1117/1.JMM.21.4.040402
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dc.contributor.authorGallagher, Emily
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.accessioned2023-04-25T10:30:27Z
dc.date.available2023-03-01T03:27:46Z
dc.date.available2023-03-07T21:39:37Z
dc.date.available2023-04-25T10:30:27Z
dc.date.embargo9999-12-31
dc.date.issued2022-12-28
dc.identifier.doi10.1117/1.JMM.21.4.040402
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41204
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage1
dc.source.endpage1
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages1
dc.source.volume21
dc.subject.disciplineEngineering
dc.subject.keywordsphase shift, EUV lithography, mask
dc.title

Attenuated phase shift masks: an interview with Andreas Erdmann

dc.typeEditorial material
dspace.entity.typePublication
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